Plasma Etch System Market (Updated Version Available)

This report studies the Plasma Etch System market. Plasma Etching System is a series of devices and equipment used together to perform plasma etching.

Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.

North America ranks the top in terms of global market size of Plasma Etch System, it consists of 48.57% of the international market in 2016. Japan comes the second, with 20.03% of the global market. Europe consists of 12.51% of the Plasma Etch System market in the same year, the other regions all together consist of 8.81%.

Applied Materials, Inc. ranks the first in terms of revenue share in Global market of Plasma Etch System, occupies 24.12% of market share in 2016; While, Lam Research, with a market share of 22.89%, comes the second; Tokyo Electron Limited, with a market share of 17.36% in 2016, comes the third. All the other manufacturers which are not included in the report together consist of approximately 27.02% of the global market in 2016.

The report offers detailed coverage of Plasma Etch System industry and main market trends. The market research includes historical and forecast market data, demand, application details, price trends, and company shares of the leading Plasma Etch System by geography. The report splits the market size, by volume and value, on the basis of application type and geography.

The report forecast global Plasma Etch System market to grow to reach xxx Million USD in 2020 with a CAGR of xx% during the period 2021-2025.

First, this report covers the present status and the future prospects of the global Plasma Etch System market for 2015-2025.
And in this report, we analyze global market from 5 geographies: Asia-Pacific[China, Southeast Asia, India, Japan, Korea, Western Asia], Europe[Germany, UK, France, Italy, Russia, Spain, Netherlands, Turkey, Switzerland], North America[United States, Canada, Mexico], Middle East & Africa[GCC, North Africa, South Africa], South America[Brazil, Argentina, Columbia, Chile, Peru].

Key Companies
Oxford Instruments
ULVAC
Lam Research
AMEC
PlasmaTherm
SAMCO Inc.
Applied Materials, Inc.
Sentech
SPTS Technologies (an Orbotech Company)
GigaLane
CORIAL
Trion Technology
NAURA
Plasma Etch, Inc.
Tokyo Electron Limited

At the same time, we classify Plasma Etch System according to the type, application by geography. More importantly, the report includes major countries market based on the type and application.

Market Segment as follows:
Market by Order Type
Inductively Coupled Plasma (ICP)
Reactive Ion Etching (RIE)
Deep Reactive Ion Etching (DRIE)
Others
Market by Application
Semiconductor Industry
Medical Industry
Electronics & Microelectronics
Others

By Region
Asia-Pacific[China, Southeast Asia, India, Japan, Korea, Western Asia]
Europe[Germany, UK, France, Italy, Russia, Spain, Netherlands, Turkey, Switzerland]
North America[United States, Canada, Mexico]
Middle East & Africa[GCC, North Africa, South Africa]
South America[Brazil, Argentina, Columbia, Chile, Peru]

The research provides answers to the following key questions:
• What is the estimated growth rate and market share and size of the Plasma Etch System market for the forecast period 2021 - 2025?
• What are the driving forces in the Plasma Etch System market for the forecast period 2021 - 2025?
• Who are the prominent market players and how have they gained a competitive edge over other competitors?
• What are the market trends influencing the progress of the Plasma Etch System industry worldwide?
• What are the major challenges and threats restricting the progress of the industry?
• What opportunities does the market hold for the prominent market players?