Sputtering Target Material Market (Updated Version Available)

Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. This report studies the sputtering target material market.
For a long time the global sputtering target development and production mainly concentrated in the United States and Japan, and the industry concentration is quite high. Manufactures of sputtering targets, represented by Honeywell (USA), Praxair (USA), JX Nippon Mining & Metals Corporation (Japan), TOSOH (Japan) and other multinational groups, have been involved in this field earlier. After decades of technical accumulation, they occupy the vast majority of market share.

Semiconductor chips, flat panel displays, solar cells and other downstream industries have a higher demand on the product quality and stability. When the downstream customers, especially the world's leading companies select suppliers, the supplier qualification barriers are higher, and the certification cycle is longer.


The report offers detailed coverage of Sputtering Target Material industry and main market trends. The market research includes historical and forecast market data, demand, application details, price trends, and company shares of the leading Sputtering Target Material by geography. The report splits the market size, by volume and value, on the basis of application type and geography.

The report forecast global Sputtering Target Material market to grow to reach xxx Million USD in 2020 with a CAGR of xx% during the period 2021-2025.

First, this report covers the present status and the future prospects of the global Sputtering Target Material market for 2015-2025.
And in this report, we analyze global market from 5 geographies: Asia-Pacific[China, Southeast Asia, India, Japan, Korea, Western Asia], Europe[Germany, UK, France, Italy, Russia, Spain, Netherlands, Turkey, Switzerland], North America[United States, Canada, Mexico], Middle East & Africa[GCC, North Africa, South Africa], South America[Brazil, Argentina, Columbia, Chile, Peru].

Key Companies
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Mitsui Mining & Smelting
Hitachi Metals
Honeywell
Sumitomo Chemical
ULVAC
Materion (Heraeus)
GRIKIN Advanced Material Co., Ltd.
TOSOH
Ningbo Jiangfeng
Heesung
Luvata
Fujian Acetron New Materials Co., Ltd
Changzhou Sujing Electronic Material
Luoyang Sifon Electronic Materials
FURAYA Metals Co., Ltd
Advantec
Angstrom Sciences
Umicore Thin Film Products

At the same time, we classify Sputtering Target Material according to the type, application by geography. More importantly, the report includes major countries market based on the type and application.

Market Segment as follows:
Market by Order Type
Metal Target
Alloy Target
Ceramic Compound Target
Market by Application
Semiconductor
Solar Energy
LCD Flat Panel Display
Others Flat Panel Display

By Region
Asia-Pacific[China, Southeast Asia, India, Japan, Korea, Western Asia]
Europe[Germany, UK, France, Italy, Russia, Spain, Netherlands, Turkey, Switzerland]
North America[United States, Canada, Mexico]
Middle East & Africa[GCC, North Africa, South Africa]
South America[Brazil, Argentina, Columbia, Chile, Peru]

The research provides answers to the following key questions:
• What is the estimated growth rate and market share and size of the Sputtering Target Material market for the forecast period 2021 - 2025?
• What are the driving forces in the Sputtering Target Material market for the forecast period 2021 - 2025?
• Who are the prominent market players and how have they gained a competitive edge over other competitors?
• What are the market trends influencing the progress of the Sputtering Target Material industry worldwide?
• What are the major challenges and threats restricting the progress of the industry?
• What opportunities does the market hold for the prominent market players?